DocumentCode :
1888946
Title :
4-inch InP crystals grown by phosphorous vapor controlled LEC method
Author :
Noda, A. ; Suzuki, K. ; Arakawa, A. ; Kurita, H. ; Hirano, R.
Author_Institution :
Compound Semicond. Mater. Dept., Nikko Mater. Co. Ltd., Ibaraki, Japan
fYear :
2002
fDate :
2002
Firstpage :
397
Lastpage :
400
Abstract :
4-inch Fe doped and S doped InP crystals have been grown by phosphorous vapor controlled LEC method (PC-LEC). By controlling the solid / liquid (SL) interface shape, the dislocation density of S doped InP crystals was reduced to less than 3 × 103 cm-2 for the whole ingot. The dislocation density of 4 inch Fe doped InP crystals was less than 5 × 104 cm-2. The total thickness variation (TTV) of 4-inch substrates was improved by optimizing the polishing conditions. The minimum TTV was about 1.6 micrometer. There was no significant difference in breakage strength between 4-inch and 3-inch Fe doped InP substrates.
Keywords :
II-VI semiconductors; Vickers hardness; crystal growth from melt; dislocation density; dislocation etching; indium compounds; iron; semiconductor growth; sulphur; Fe doped InP crystals; Fe doped InP substrates; InP:Fe,S; P vapor controlled liquid encapsulated Czochralski method; S doped InP crystals; breakage strength; dislocation density; polishing conditions; solid/liquid interface shape; total thickness variation; Crystalline materials; Crystals; Frequency; Indium phosphide; Iron; Phosphors; Semiconductor materials; Shape control; Substrates; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Indium Phosphide and Related Materials Conference, 2002. IPRM. 14th
ISSN :
1092-8669
Print_ISBN :
0-7803-7320-0
Type :
conf
DOI :
10.1109/ICIPRM.2002.1014451
Filename :
1014451
Link To Document :
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