• DocumentCode
    1889148
  • Title

    Stability investigation of high aspect ratio n-type silicon field emitter arrays

  • Author

    Bachmann, M. ; Dams, F. ; Dusberg, F. ; Hofmann, M. ; Pahlke, A. ; Langer, C. ; Lawrowski, R. ; Prommesberger, C. ; Schreiner, R.

  • Author_Institution
    R&D Detectors, KETEK GmbH, Munich, Germany
  • fYear
    2015
  • fDate
    13-17 July 2015
  • Firstpage
    204
  • Lastpage
    205
  • Abstract
    Electron sources based on silicon field emitter arrays, produced in processes based on semiconductor technology, are good candidates for a miniaturized X-ray source. A key parameter for this application is the stability of the X-ray photon flux and, thus, the emission current. In the present work we have investigated the influence of the residual gas pressure and a resistor in series on the emission stability of a high aspect ratio n-type silicon emitter array with hybrid extraction electrode. An increase of current fluctuations was found for pressures above 10-6 mbar. High resistances in series to the emitter array alter the emission characteristics, but greatly suppress spikes in the emission current and improve its stability. This, however, strongly depends on the bias point. The field enhancement factor is not affected by the resistance. In a long term measurement the emission current was found to be constant after an initial phase of degradation.
  • Keywords
    X-ray production; elemental semiconductors; field emitter arrays; particle beam stability; silicon; Si; X-ray photon flux stability; electron source; emission current; emission stability; high aspect ratio field emitter array; miniaturized X-ray source; residual gas pressure; semiconductor technology; Current measurement; Field emitter arrays; Resistance; Resistors; Silicon; Stability analysis; Thermal stability; XRF spectroscopy; emission current stability; field emitter array; semiconductor field emission; silicon tips;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Nanoelectronics Conference (IVNC), 2015 28th International
  • Conference_Location
    Guangzhou
  • Print_ISBN
    978-1-4673-9356-0
  • Type

    conf

  • DOI
    10.1109/IVNC.2015.7225584
  • Filename
    7225584