Title :
SEMATECH projects in advanced process control
Author :
Bogardus, E. Hal ; Bakshi, Vivek ; Gragg, John
Author_Institution :
SEMATECH, Austin, TX, USA
Abstract :
Scatterometer measurements of critical dimensions paralleled those of atomic force microscopy down to 0.14 μm. Application of a run to run controller to chemical mechanical processes demonstrated control to target for patterned wafers and improvements in CpK of 150% for epitaxial processes. Benchmarking of commercial software for fault detection of plasma etchers demonstrated feasibility in identifying faults during operation
Keywords :
automatic test software; cluster tools; fault diagnosis; integrated circuit manufacture; measurement by laser beam; optical sensors; photolithography; polishing; process control; size measurement; 1D periodic structures; SEMATECH projects; advanced process control; benchmarking; chemical mechanical processes; commercial software; control to target; critical dimensions; data mining; epitaxial processes; fault detection; faults identification; model-based control; optical sensor; patterned wafers; plasma etchers; resist features; run to run controller; scatterometer measurements; Application software; Atomic force microscopy; Atomic layer deposition; Atomic measurements; Chemical processes; Fault detection; Force measurement; Plasma measurements; Process control; Radar measurements;
Conference_Titel :
Semiconductor Manufacturing Conference Proceedings, 1997 IEEE International Symposium on
Conference_Location :
San Francisco, CA
Print_ISBN :
0-7803-3752-2
DOI :
10.1109/ISSM.1997.664499
