SEMATECH projects in advanced process control

Author

Bogardus, E. Hal ; Bakshi, Vivek ; Gragg, John

Author_Institution

SEMATECH, Austin, TX, USA

fYear

1997

fDate

6-8 Oct 1997

Abstract

Scatterometer measurements of critical dimensions paralleled those of atomic force microscopy down to 0.14 μm. Application of a run to run controller to chemical mechanical processes demonstrated control to target for patterned wafers and improvements in CpK of 150% for epitaxial processes. Benchmarking of commercial software for fault detection of plasma etchers demonstrated feasibility in identifying faults during operation

Keywords

automatic test software; cluster tools; fault diagnosis; integrated circuit manufacture; measurement by laser beam; optical sensors; photolithography; polishing; process control; size measurement; 1D periodic structures; SEMATECH projects; advanced process control; benchmarking; chemical mechanical processes; commercial software; control to target; critical dimensions; data mining; epitaxial processes; fault detection; faults identification; model-based control; optical sensor; patterned wafers; plasma etchers; resist features; run to run controller; scatterometer measurements; Application software; Atomic force microscopy; Atomic layer deposition; Atomic measurements; Chemical processes; Fault detection; Force measurement; Plasma measurements; Process control; Radar measurements;

fLanguage

English

Publisher

ieee

Conference_Titel

Semiconductor Manufacturing Conference Proceedings, 1997 IEEE International Symposium on

Conference_Location

San Francisco, CA

Print_ISBN

0-7803-3752-2

Type

conf

DOI

10.1109/ISSM.1997.664499

Filename

664499