Title :
InP-based HEMT technologies toward 100 Gbit/s ICs
Author_Institution :
NTT Photonics Labs., NIT Corp., Atsugi, Japan
Abstract :
This paper describes HEMT IC technology developed at NTT for 50 Gbit/s ICs, which are the key components in 40 Gbit/s optical communications systems these days. We have successfully integrated state-of-the-art HEMTs and achieved stable operation of D-FFs at over 50 Gbit/s with high yield and uniformity. It also discusses the potential of the technology for achieving 100 Gbit/s-class ICs and clarifies the HEMT performance requirements. The target performance of HEMTs is a gm of over 1.4 S/mm with an fT of over 280 GHz. Scaling down of HEMTs and reducing their parasitic capacitance are the major issues in achieving 100 Gbit/s operations.
Keywords :
HEMT integrated circuits; III-V semiconductors; capacitance; circuit stability; field effect digital integrated circuits; high-speed integrated circuits; indium compounds; 1.4 S/mm; 280 GHz; 50 to 100 Gbit/s; D-type flip flops; InP; InP-based HEMT IC technology; NTT; monolithic integration; optical communications systems; parasitic capacitance reduction; stable operation; Data communication; Electron mobility; FETs; Frequency conversion; HEMTs; Indium gallium arsenide; Indium phosphide; Optical fiber communication; Parasitic capacitance; Photonic integrated circuits;
Conference_Titel :
Indium Phosphide and Related Materials Conference, 2002. IPRM. 14th
Print_ISBN :
0-7803-7320-0
DOI :
10.1109/ICIPRM.2002.1014462