Title :
Modeling electro-negative RF-discharges in the low pressure regime
Author_Institution :
Siemens AG, Germany
Abstract :
Summary form only given. A new fluid dynamics/Monte-Carlo hybrid approach to the self-consistent simulation of electro-negative RF-discharges in the low pressure regime is described. The model is an extension of a previously presented formalism for electropositive discharges and is intended to capture the essential physics of micro-electronic manufacturing processes like plasma etching (PE), reactive ion etching (RIE), and plasma enhanced chemical vapor deposition (PECVD).
Keywords :
Monte Carlo methods; high-frequency discharges; plasma CVD; plasma simulation; sputter etching; electro-negative RF-discharges; fluid dynamics/Monte-Carlo hybrid approach; low pressure regime; micro-electronic manufacturing processes; plasma enhanced chemical vapor deposition; plasma etching; reactive ion etching; self-consistent simulation; Dielectrics; Electrons; Electrostatics; Etching; Physics; Plasma applications; Plasma chemistry; Plasma materials processing; Plasma simulation; Poisson equations;
Conference_Titel :
Plasma Science, 1997. IEEE Conference Record - Abstracts., 1997 IEEE International Conference on
Conference_Location :
San Diego, CA, USA
Print_ISBN :
0-7803-3990-8
DOI :
10.1109/PLASMA.1997.604967
