• DocumentCode
    1889885
  • Title

    Photoluminescence behaviour of GaInNAs quantum wells annealed at high temperature

  • Author

    Ng, T.K. ; Yoon, S.F. ; Wang, S.Z. ; Loke, W.K. ; Fan, W.J. ; Yew, K.C. ; Sun, Z.Z.

  • Author_Institution
    Sch. of Electr. & Electron. Eng., Nanyang Technol. Univ., Singapore, Singapore
  • fYear
    2002
  • fDate
    2002
  • Firstpage
    543
  • Lastpage
    546
  • Abstract
    The photoluminescence (PL) characteristics of GaInNAs quantum wells (QWs) after high temperature post-growth annealing were studied. The QWs were grown using a radio frequency (RF) nitrogen plasma source in conjunction with a solid source molecular beam epitaxy (SSMBE) system. It is found that annealing at high temperature (840°C) and long duration (10 min) results in significant improvement in the PL characteristics of the GaInNAs QWs. The PL intensity of the GaInNAs QW could improve by as much as 30 times after annealing, and its full-width-at-half-maximum (FWHM) reduces from 63.1 meV to a small value of 16.3 meV after annealing. There are two blueshift regions in the wavelength shift vs. nitrogen composition curve that shows the GaInNAs PL blueshift after annealing as a function of nitrogen composition. For as-grown GaInNAs QWs with a low nitrogen composition of less than ∼1% (Region A), increasing indium composition from 22% to 30% during growth results in an increase of PL blueshift (after annealing) from 72 nm to 87 nm. On the other hand, for the as-grown GaInNAs QWs having higher nitrogen compositions of ∼1% to ∼3% (Region B), indium compositions (within the range of 19.5% and 25%) was found to have insignificant effect on the PL blueshift. In fact, the PL blueshift (as a result of annealing) increases rapidly from 72 nm to ∼200 nm. The dominant mechanisms that give rise to the blueshift of the PL peak wavelength in GaInNAs QWs are proposed based on the PL, X-ray diffraction (XRD) and reflection high electron energy diffraction (RHEED) observations. The investigation has important implications for the growth of GaInNAs-based laser emitting at 1.31 μm wavelength.
  • Keywords
    III-V semiconductors; X-ray diffraction; annealing; gallium arsenide; gallium compounds; high-temperature effects; indium compounds; interface structure; molecular beam epitaxial growth; photoluminescence; reflection high energy electron diffraction; semiconductor growth; semiconductor quantum wells; spectral line breadth; spectral line intensity; spectral line shift; 10 min; 840 C; FWHM; GaInNAs; GaInNAs quantum wells; PL characteristics; PL intensity; QWs; RHEED; X-ray diffraction; XRD; blueshift; full-width-at-half-maximum; high temperature post-growth annealing; laser; nitrogen composition; photoluminescence; radio frequency nitrogen plasma source; reflection high electron energy diffraction; solid source molecular beam epitaxy; Annealing; Indium; Molecular beam epitaxial growth; Nitrogen; Photoluminescence; Plasma sources; Plasma temperature; Radio frequency; Solids; X-ray diffraction;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Indium Phosphide and Related Materials Conference, 2002. IPRM. 14th
  • ISSN
    1092-8669
  • Print_ISBN
    0-7803-7320-0
  • Type

    conf

  • DOI
    10.1109/ICIPRM.2002.1014486
  • Filename
    1014486