Title :
Application of in-situ particle monitoring in defect management system under clean manufacturing environment
Author :
Chen, Vincent M C ; Chow, Apple Wanyee ; Milor, Linda ; Peng, Yeng-kaung
Author_Institution :
Submicron Dev. Center, Adv. Micro Devices Inc., Sunnyvale, CA, USA
Abstract :
In-situ Particle Monitors (ISPM) have been adopted in the industry for optimizing cleaning cycles and detecting equipment abnormalities. However, in advanced manufacturing environments where the equipment is well maintained and where yield-dominating excursions rarely happen, the ISPM signal is usually too weak to use for yield monitoring. This paper details what we did to optimize ISPM sensitivity performance for non-excursion conditions, analyzes the results, and presents an alternative approach for integrating ISPM in defect management systems
Keywords :
clean rooms; computerised monitoring; inspection; integrated circuit yield; particle counting; sputter etching; surface cleaning; advanced manufacturing environments; clean manufacturing environment; cleaning cycles optimization; defect management system; equipment abnormalities detection; in-situ particle monitoring; nonexcursion conditions; plasma etch; sensitivity performance; single-wafer etch system; surfscan count; yield monitoring; Cleaning; Environmental management; Etching; Geometry; Manufacturing; Monitoring; Performance analysis; Plasma applications; Pollution measurement; Velocity measurement;
Conference_Titel :
Semiconductor Manufacturing Conference Proceedings, 1997 IEEE International Symposium on
Conference_Location :
San Francisco, CA
Print_ISBN :
0-7803-3752-2
DOI :
10.1109/ISSM.1997.664502
