DocumentCode :
1890876
Title :
Implementation of an in situ moisture sensor to improve utilization and performance of a rapid thermal processor
Author :
Haider, Asad ; Brookshire, Jody ; Kuan, Y. Richard ; McAndrew, James ; Inman, Ronald
Author_Institution :
Texas Instrum. Inc., Dallas, TX, USA
fYear :
1997
fDate :
6-8 Oct 1997
Abstract :
A novel in situ moisture sensor based on tunable diode laser spectroscopy has been used to monitor water vapor during titanium silicide formation and annealing. The relationship between water vapor level and sheet resistivity in titanium silicide formation was discussed in another recent publication. In this paper we show that the sensor is useful in optimizing purge procedures and also as a safeguard against accidental ambient contamination and similar incidents. It can be anticipated that the sensor output will eventually be fed back to the tool in order to be used directly in control of purging and other process steps
Keywords :
hygrometers; integrated circuit metallisation; measurement by laser beam; moisture measurement; optical sensors; rapid thermal annealing; rapid thermal processing; surface contamination; titanium compounds; RTA; accidental ambient contamination safeguard; improved performance; improved utilization; in situ moisture sensor; purge procedures; rapid thermal processor; sensor output; titanium silicide formation; tunable diode laser spectroscopy; water vapor monitoring; Annealing; Conductivity; Diode lasers; Moisture; Monitoring; Silicides; Spectroscopy; Titanium; Tunable circuits and devices; Water pollution;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Manufacturing Conference Proceedings, 1997 IEEE International Symposium on
Conference_Location :
San Francisco, CA
Print_ISBN :
0-7803-3752-2
Type :
conf
DOI :
10.1109/ISSM.1997.664505
Filename :
664505
Link To Document :
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