Spatially resolved endpoint detector for plasma etcher

Author

Chen, Roawen ; Rangan, Sundeep ; Spanos, Costas J.

Author_Institution

Dept. of Electr. Eng. & Comput. Sci., California Univ., Berkeley, CA, USA

fYear

1997

fDate

6-8 Oct 1997

Abstract

In this paper we present a novel spatially resolved sensor to detect the endpoint and monitor spatial uniformity for a plasma etching process. A scanning spatially-resolved optical emission spectroscopy (SROES) system was built and installed in Berkeley´s Microfabrication Laboratory. This sensor system consists of a stepper motor, controller, and a monochrometer, which provides an in-situ real-time monitoring of the etching endpoint spatially. In this paper, we show the promise of this spatially-resolved endpoint detector, and explain our hardware design and the future experiment plan

Keywords

atomic emission spectroscopy; computerised monitoring; integrated circuit yield; optical sensors; plasma diagnostics; process control; spectroscopy computing; sputter etching; IC production; controller; hardware design; in-situ real-time monitoring; monochrometer; plasma etcher; scanning spatially-resolved optical emission spectroscopy; sensor-aided manufacturing; spatial uniformity monitoring; spatially resolved endpoint detector; spatially resolved sensor; stepper motor; Detectors; Etching; Laboratories; Monitoring; Optical sensors; Plasma applications; Sensor systems; Spatial resolution; Spectroscopy; Stimulated emission;

fLanguage

English

Publisher

ieee

Conference_Titel

Semiconductor Manufacturing Conference Proceedings, 1997 IEEE International Symposium on

Conference_Location

San Francisco, CA

Print_ISBN

0-7803-3752-2

Type

conf

DOI

10.1109/ISSM.1997.664508

Filename

664508