Title :
Photoforming applied to fine machining
Author :
Takagi, Tarou ; Nakajima, Naomasa
Author_Institution :
Dept. of Eng. Synthesis, Tokyo Univ., Japan
Abstract :
Photoforming refers to optical forming methods such as stereolithography, photomask layering, and the 1H process. In these processes, a special liquid resin is used as forming material and solidified by light exposure. The authors applied this method to making micromachines. A theoretical analysis including computer simulation of photon behavior in the liquid resin shows that sharp focusing is not required to achieve high precision, but controlling of light amount is important for a good result. It is proved that resolution can be within a few micrometers. Results of experimental forming demonstrate the possibility of making such precise structures. Some microscopic models with a resolution of 8 mm and some movable models were formed. It is suggested that this process can be applied to the construction of three-dimensional fine structures and precise mechanisms
Keywords :
forming processes; masks; micromechanical devices; optical variables control; photolithography; 1H process; computer simulation; exposure control; fine machining; liquid resin; micromachines; microscopic models; movable models; optical forming methods; photoforming; photomask layering; photon behavior; precise mechanisms; stereolithography; three-dimensional fine structures; Computer simulation; Containers; Elevators; Lighting control; Machining; Microscopy; Optical control; Optical materials; Resins; Shape control;
Conference_Titel :
Micro Electro Mechanical Systems, 1993, MEMS '93, Proceedings An Investigation of Micro Structures, Sensors, Actuators, Machines and Systems. IEEE.
Conference_Location :
Fort Lauderdale, FL
Print_ISBN :
0-7803-0957-X
DOI :
10.1109/MEMSYS.1993.296927