DocumentCode :
1892176
Title :
A site wide risk assessment at Intel Corporation in New Mexico
Author :
Casciano, James R.
Author_Institution :
Intel Corp., Rio Rancho, NM, USA
fYear :
1997
fDate :
6-8 Oct 1997
Abstract :
Intel New Mexico has received intense public scrutiny since the construction of Fab 11, RR4, RR5, and the supporting Central Utilities buildings. Community concerns about routine emissions of chemicals, and the potential accidental release had been raised individually and in public forums. While Intel has historically incorporated risk assessment and risk management into facility and process design and installation, no analysis existed of the combined risk from the entire facility. A site-wide assessment conducted by an independent third party evaluator, Radian International Incorporated and used inspections, interviews and record checking to evaluate the facility for risk potential based on Environmental Protection Agency and Occupational Safety and Health Administration regulations and guidance. Toxicological review was also done for all manufacturing chemicals. Dispersion and uptake modeling was performed to evaluate risk to surrounding populations. The risk assessment has been used as a communication tool with neighborhood groups, industry counterparts, and regulatory agencies. A summary of key learning, costs and benefits will be presented in the paper. Results from the assessment showed risks to the community to be well within all acceptable risk criteria
Keywords :
cost-benefit analysis; government policies; health hazards; integrated circuit manufacture; pollution control; risk management; safety; EPA/OSHA regulations; Intel Corporation; New Mexico; benefits; catastrophic risk; chronic risk; combined risk; community concerns; costs; entire facility; potential accidental release; risk management; routine emissions of chemicals; site wide risk assessment; toxicological review; Buildings; Chemicals; Inspection; Manufacturing; Occupational safety; Process design; Protection; Risk analysis; Risk management; Toxicology;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Manufacturing Conference Proceedings, 1997 IEEE International Symposium on
Conference_Location :
San Francisco, CA
Print_ISBN :
0-7803-3752-2
Type :
conf
DOI :
10.1109/ISSM.1997.664519
Filename :
664519
Link To Document :
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