The coupling of an N-well CMOS fabrication laboratory course with the SEMATECH Center of Excellence in Multilevel Metallization at Rensselaer

Author

Price, David T. ; Gutmann, Ronald I. ; Haley, Norman J. ; Muraka, S.P. ; Saxena, Arjun N. ; Chow, T. Paul ; Ramkumar, K. ; Lakshminarayanan, S. ; Bhalla, Anup

Author_Institution

Center for Integrated Electron., Rensselaer Polytech. Inst., Troy, NY, USA

fYear

1993

fDate

18-19 May 1993

Firstpage

183

Lastpage

187

Abstract

The Center for Integrated Electronics (CIE) at Rensselaer Polytechnic Institute is utilizing front-end processing, developed for, and performed in, a CMOS fabrication laboratory course as a foundry service for back-end of the line search. The goal of the fabrication laboratory course is to expose students to the fabrication of 2-micron CMOS integrated circuits through first level metallization and electrical testing. The SEMATECH Center of Excellence (SCOE) on Multilevel Metallization at Rensselaer is primarily focused on back-end of the line unit process research and has added an important task on process integration. The mask design and process steps used for both the course and SCOE research are outlined

Keywords

CMOS integrated circuits; educational courses; integrated circuit technology; integrated circuit testing; laboratory apparatus and techniques; masks; metallisation; CMOS integrated circuits; N-well CMOS fabrication laboratory course; SEMATECH; electrical testing; first level metallization; foundry service; mask design; multilevel metallisation; process integration; CMOS process; CMOS technology; Circuit testing; Cobalt; Copper; Fabrication; Laboratories; Lithography; Metallization; Silicides;

fLanguage

English

Publisher

ieee

Conference_Titel

University/Government/Industry Microelectronics Symposium, 1993., Proceedings of the Tenth Biennial

Conference_Location

Research Triangle Park, NC

ISSN

0749-6877

Print_ISBN

0-7803-0990-1

Type

conf

DOI

10.1109/UGIM.1993.297010

Filename

297010