• DocumentCode
    1894028
  • Title

    Metallization for microelectronics program at the University at Albany: leveraging a long-term mentor relationship

  • Author

    Fury, Michael A. ; Kaloyeros, Alain E.

  • Author_Institution
    IBM Corp., Hopewell Junction, NY, USA
  • fYear
    1993
  • fDate
    18-19 May 1993
  • Firstpage
    59
  • Lastpage
    64
  • Abstract
    The program in chemical vapor deposition, (CVD) of metals for microelectronics applications at the University at Albany, SUNY, is presented as a working model for a broad, basic and applied research program. The proximity of SUNYA to IBM facilities has allowed the role of industrial mentor to expand to include appointment as adjunct professor or industry advisor to a Semiconductor Research Corporation fellow, and to submission of research proposals with a mentor as co-principal investigator and as associate director. Such depth of mutual commitment serves to ensure industrial relevance for both students and faculty. It provides a reliable resource for precompetitive research and early development
  • Keywords
    chemical vapour deposition; integrated circuit technology; metallisation; research and development management; CVD; IBM facilities; SUNYA; chemical vapor deposition; long-term mentor relationship; metallisation; metals; microelectronics program; research program; Chemical elements; Chemical vapor deposition; Costs; Joining materials; Metallization; Microelectronics; Proposals; Semiconductor thin films; Sputtering; Technology transfer;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    University/Government/Industry Microelectronics Symposium, 1993., Proceedings of the Tenth Biennial
  • Conference_Location
    Research Triangle Park, NC
  • ISSN
    0749-6877
  • Print_ISBN
    0-7803-0990-1
  • Type

    conf

  • DOI
    10.1109/UGIM.1993.297036
  • Filename
    297036