DocumentCode :
1894100
Title :
The use of STADIUM statistical TCAD simulation methodology in industrial environments
Author :
Sanders, Thomas J. ; Shahsavari, M. Mehdi ; Means, Dale P.
Author_Institution :
Dept. of Electr. & Comput. Eng., Florida Inst. of Technol., Melbourne, FL, USA
fYear :
1993
fDate :
18-19 May 1993
Firstpage :
46
Lastpage :
50
Abstract :
The software program called STADIUM has been developed by researchers at Florida Institute of Technology. The purpose of STADIUM is to facilitate the statistical design and simulation of integrated processes, devices and products. It is a software shell which uses existing simulators in a design of experiments statistical methodology, and which allows the estimation of the statistical response of the manufacturing environment. Some of the details of STADIUM are described together with activities of the Florida SEMATECH Center of Excellence to implement this software in several industrial environments
Keywords :
circuit CAD; production engineering computing; semiconductor device models; semiconductor process modelling; statistical analysis; STADIUM statistical TCAD simulation methodology; design for manufacturing; design of experiments statistical methodology; device simulation; industrial environments; integrated circuit; integrated process simulation; manufacturing environment; product simulation; software program; statistical design; statistical response; Circuit simulation; Computational modeling; Computer industry; Design for manufacture; Integrated circuit yield; Manufacturing processes; Predictive models; Software tools; Statistical analysis; Virtual manufacturing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
University/Government/Industry Microelectronics Symposium, 1993., Proceedings of the Tenth Biennial
Conference_Location :
Research Triangle Park, NC
ISSN :
0749-6877
Print_ISBN :
0-7803-0990-1
Type :
conf
DOI :
10.1109/UGIM.1993.297039
Filename :
297039
Link To Document :
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