DocumentCode :
189415
Title :
Novel stationary phase for silicon gas chromatography microcolumns
Author :
Ricoul, F. ; Lefebvre, D. ; Bellemin-Comte, A. ; David, N. ; Bourlon, B. ; Jousseaume, V. ; Marcoux, C. ; Ollier, E. ; Petitjean, M. ; Puget, P.
Author_Institution :
LETI, CEA, Grenoble, France
fYear :
2014
fDate :
2-5 Nov. 2014
Firstpage :
206
Lastpage :
208
Abstract :
This paper presents the implementation for the first time of a porous SiOCH thin layer as stationary phase for silicon microcolumns for gas chromatography (GC). Deposition of the hybrid layer was obtained by plasma-enhanced-chemical-vapor-deposition (PECVD) with a porogen approach. Conformal and collective coating of the microcolumns was achieved and BTEX (Benzene, Toluene, Ethyl-benzene, o-Xylene) mixture could be separated with a good efficiency. This new process enables to consider a mass production of efficient microcolumns that is needed for the development of miniaturized, low cost, portable GC systems, e.g. for air quality monitoring.
Keywords :
chromatography; conformal coatings; mass production; microsensors; organic compounds; plasma CVD coatings; porous semiconductors; silicon compounds; thin film sensors; BTEX mixture; PECVD; SiOCH; benzene toluene ethyl-benzene o-xylene; collective coating; conformal coating; hybrid layer deposition; mass production; plasma enhanced chemical vapor deposition; porogen approach; porous SiOCH thin layer; silicon gas chromatography microcolumns; stationary phase; Chemistry; Coatings; Gas chromatography; Scanning electron microscopy; Silicon; Silicon compounds; Temperature; SiOCH; gas chromatography; micro-column; stationary phase;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
SENSORS, 2014 IEEE
Conference_Location :
Valencia
Type :
conf
DOI :
10.1109/ICSENS.2014.6984969
Filename :
6984969
Link To Document :
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