• DocumentCode
    1894484
  • Title

    Plasma standard cell for laboratory demonstrations and experiments

  • Author

    Lane, Richard L. ; Grimsley, Thomas J.

  • Author_Institution
    Dept. of Microelectron. Eng., Rochester Inst. of Technol., NY, USA
  • fYear
    1993
  • fDate
    18-19 May 1993
  • Firstpage
    213
  • Lastpage
    218
  • Abstract
    The design, construction, and use of an apparatus for undergraduate laboratory experimentation and demonstration in the area of plasma technology and processes are described. Specific experiments being utilized are detailed. Plans for additional equipment features are discussed
  • Keywords
    demonstrations; education; integrated circuit technology; laboratory apparatus and techniques; plasma applications; semiconductor technology; laboratory apparatus; laboratory demonstrations; microelectronic fabrication; plasma processes; plasma standard cell; plasma technology; undergraduate laboratory experimentation; Educational institutions; Electrodes; Fabrication; Laboratories; Microelectronics; Plasma applications; Plasma materials processing; Sputter etching; Sputtering; Wet etching;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    University/Government/Industry Microelectronics Symposium, 1993., Proceedings of the Tenth Biennial
  • Conference_Location
    Research Triangle Park, NC
  • ISSN
    0749-6877
  • Print_ISBN
    0-7803-0990-1
  • Type

    conf

  • DOI
    10.1109/UGIM.1993.297055
  • Filename
    297055