Extended unbalanced magnetron sputtering system with a cylindrical cathode

The construction of extended unbalanced magnetron sputtering system on the basis of the cylindrical magnetron with a rotating cathode was developed and fabricated. The unbalanced configuration of magnetic field was realised by means of additional lines of permanent magnets, placed along both sides of an 89-mm outer diameter and 600-mm long cylindrical cathode. The performance of the unbalanced magnetron was assessed in terms of the ion current density and the ion-to-atom ratio incident at the substrate. Furthermore, the paper presents the comparison of the internal plasma parameters, such as the electron temperature, electron density, plasma and floating potentials, measured by a Langmuir probe in various positions from the cathode, for conventional and unbalanced constructions of the cylindrical magnetron. The plasma density and ion current density are about 3-5 times higher in the unbalanced magnetron in a 0.24 Pa Ar atmosphere with a DC cathode power of 3 kW.