The preparation and properties of LaNi/sub 5/-teflon thin films

Summary form only given. The LaNi/sub 5/-teflon thin films were prepared by magnetron RF-sputtering deposition technique from two targets sequently. Teflon and LaNi/sub 5/ composition were used as the two targets respectively. The structure of the film which was postannealed in certain conditions was characterized by XRD and TEM. The experimental results showed that LaNi/sub 5/ alloy particles were uniformly embedded in teflon matrix and the film was in nanometer size. It was found that the new type of thin films efficiently improved the durability of dotted LaNi/sub 5/ particles in the cycles of hydrogen absorption-desorption while keeping many advantages of LaNi/sub 5/ films. The electrical resistance versus the hydrogen storage capacity of the composite films was characterited by several methods.