Title :
Edge terminations for SiC high voltage Schottky rectifiers
Author :
Bhatnagar, M. ; Nakanishi, H. ; Bothra, S. ; McLarty, P.K. ; Baliga, B.J.
Author_Institution :
Power Semicond. Res. Center, North Carolina State Univ., Raleigh, NC, USA
Abstract :
A study of floating metal field rings (FMRs) and resistive Schottky barrier field plate (RESP) edge terminations for high-voltage silicon carbide (SiC) Schottky barrier diodes (SBD) is reported. For a drift region doping of 2×1016 cm-3, numerical simulations indicated a breakdown voltage for an unterminated diode of about 225 V as compared to ≈1125 V for a parallel plane structure. For the FMR termination, simulations indicate a breakdown voltage of ≈600 V for a three-ring termination with a ring spacing of 0.8 μm. Experimentally determined breakdown voltages of SiC SBDs fabricated using FMR termination were >400 V as compared to ≈220 V for unterminated diodes. For the RESP termination, an analytical model was developed to study the effect of various design parameters, such as RESP length and sheet-resistance, on the breakdown voltage. This model was used to optimize various design parameters for SBDs fabricated using RESP termination
Keywords :
Schottky-barrier diodes; electric breakdown of solids; semiconductor device models; semiconductor materials; silicon compounds; solid-state rectifiers; 220 to 1125 V; Schottky barrier diodes; SiC; breakdown voltage; design parameters; edge terminations; floating metal field rings; high voltage Schottky rectifiers; model; resistive Schottky barrier field plate; sheet-resistance; simulations; three-ring termination; Analytical models; Design optimization; Doping; Magnetic resonance; Numerical simulation; Rectifiers; Schottky barriers; Schottky diodes; Silicon carbide; Voltage;
Conference_Titel :
Power Semiconductor Devices and ICs, 1993. ISPSD '93., Proceedings of the 5th International Symposium on
Conference_Location :
Monterey, CA
Print_ISBN :
0-7803-1313-5
DOI :
10.1109/ISPSD.1993.297115