DocumentCode
1895499
Title
Nickel — Alumina nanostructures formation by electrochemical processing for high-density data storage devices
Author
Sokol, V.A. ; Vorobjova, A.I. ; Outkina, E.A.
Author_Institution
Belarussian State Univ. of Inf. & Radioelectron., Minsk, Belarus
fYear
2012
fDate
10-14 Sept. 2012
Firstpage
701
Lastpage
702
Abstract
The features of uniform nickel electrochemical deposition into the pores of thin ordered porous anodic alumina (PA) are considered. The influence of deposition conditions on ordering and topological parameters of nickel nanopillars are investigated. The impact of the barrier layer thinning process at the PA pores bottom on the origination and growth of the ordered metal nanopillars is discussed.
Keywords
alumina; electrodeposition; nanofabrication; nanoporous materials; nickel; Ni-Al2O3; barrier layer thinning; electrochemical deposition; high-density data storage devices; nickel nanopillars; nickel-alumina nanostructures; ordered metal nanopillars; thin-ordered porous anodic alumina pores; topological parameters; Aluminum; Anodes; Electronic mail; Films; Nickel; Perpendicular magnetic recording; Surface treatment;
fLanguage
English
Publisher
ieee
Conference_Titel
Microwave and Telecommunication Technology (CriMiCo), 2012 22nd International Crimean Conference
Conference_Location
Sevastopol, Crimea
Print_ISBN
978-1-4673-1199-1
Type
conf
Filename
6336155
Link To Document