Title :
Sharp needle tip formation based on triangular pyramidal structure
Author :
Imaeda, K. ; Bessho, K. ; Shikida, M.
Author_Institution :
Dept. of Micro-nano Syst. Eng., Nagoya Univ., Nagoya, Japan
Abstract :
A Si triangular pyramidal structure was proposed to produce a sharp needle tip for MEMS applications. It has the advantage that it can always become sharp because the vertex of a triangular pyramid becomes a point and is not affected by fabrication errors. The triangular etching mask in which three planes dominate the etched shape was designed based on an eight-sided pyramid formation. Finally, a Si triangular pyramidal needle was fabricated by photolithography and anisotropic TMAH (25.0 wt.%, 70°C) wet etching. The height of the needle was 0.1 mm. It is clear that the vertex of the triangular pyramid successfully became a point because of its shape. A sharp needle tip with a radius of less than 1.0 μm was obtained.
Keywords :
elemental semiconductors; etching; masks; microfabrication; micromechanical devices; needles; photolithography; silicon; wetting; MEMS application; Si; anisotropic TMAH; distance 0.1 mm; eight-sided pyramid formation; microfabrication; photolithography; sharp needle tip formation; temperature 70 degC; triangular etching mask; triangular pyramidal structure; wet etching; Etching; Irrigation; Needles; Resists; Silicon; Micro-needle; anisotropic wet etching; atomic force microscope; probe; triangular pyramid;
Conference_Titel :
SENSORS, 2014 IEEE
Conference_Location :
Valencia
DOI :
10.1109/ICSENS.2014.6985059