DocumentCode :
1896266
Title :
Oxidation Modeling of Thin SiO/sub 2/ Using N/sub 2/O for Deep Submicron Cmos Technology
Author :
Sun, S.C. ; Chang, H.Y. ; Chao, T.S.
Author_Institution :
National Nano Device Laboratory, Chiao Tung University, Taiwan
fYear :
1993
fDate :
6-7 March 1993
Firstpage :
45
Lastpage :
46
Keywords :
CMOS technology; Chaos; Electron traps; Furnaces; Hydrogen; Oxidation; Semiconductor device modeling; Silicon; Sun; Temperature distribution;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Modeling & Simulation, 1993. SMS Technical Digest. 1993 Symposium on
Conference_Location :
Taipei, Taiwan
Print_ISBN :
0-7803-1225-2
Type :
conf
DOI :
10.1109/SMS.1993.664547
Filename :
664547
Link To Document :
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