DocumentCode :
1901657
Title :
The evolution of monolithic and polylithic interconnect technology
Author :
Meindl, J.D.
Author_Institution :
Microelectron. Res. Center, Georgia Inst. of Technol., Atlanta, GA, USA
fYear :
2002
fDate :
13-15 June 2002
Firstpage :
2
Lastpage :
5
Abstract :
Monolithic interconnect technology has evolved rapidly over the past four decades in order to keep pace with advances in transistor density and performance. Optimal reverse scaling, integrated architectures for global signal, power and clock distribution networks of a heterogeneous system-on-a-chip, 3D integration and microphotonic interconnects offer promising approaches to satisfy future stringent monolithic interconnect requirements of GSI. Polylithic integration featuring batch processing of high density chip input/output interconnects and high density printed wiring board interconnects is projected as an increasingly important feature of future gigascale microsystems.
Keywords :
ULSI; VLSI; integrated circuit interconnections; monolithic integrated circuits; 3D integration; GSI; SoC; batch processing; high density chip input/output interconnects; microphotonic interconnects; monolithic interconnect technology; optimal reverse scaling; polylithic interconnect technology; system-on-a-chip; Copper; Delay; Energy dissipation; Frequency; Integrated circuit interconnections; MOSFET circuits; Metal-insulator structures; Power system interconnection; Scattering; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Circuits Digest of Technical Papers, 2002. Symposium on
Conference_Location :
Honolulu, HI, USA
Print_ISBN :
0-7803-7310-3
Type :
conf
DOI :
10.1109/VLSIC.2002.1015027
Filename :
1015027
Link To Document :
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