• DocumentCode
    1901657
  • Title

    The evolution of monolithic and polylithic interconnect technology

  • Author

    Meindl, J.D.

  • Author_Institution
    Microelectron. Res. Center, Georgia Inst. of Technol., Atlanta, GA, USA
  • fYear
    2002
  • fDate
    13-15 June 2002
  • Firstpage
    2
  • Lastpage
    5
  • Abstract
    Monolithic interconnect technology has evolved rapidly over the past four decades in order to keep pace with advances in transistor density and performance. Optimal reverse scaling, integrated architectures for global signal, power and clock distribution networks of a heterogeneous system-on-a-chip, 3D integration and microphotonic interconnects offer promising approaches to satisfy future stringent monolithic interconnect requirements of GSI. Polylithic integration featuring batch processing of high density chip input/output interconnects and high density printed wiring board interconnects is projected as an increasingly important feature of future gigascale microsystems.
  • Keywords
    ULSI; VLSI; integrated circuit interconnections; monolithic integrated circuits; 3D integration; GSI; SoC; batch processing; high density chip input/output interconnects; microphotonic interconnects; monolithic interconnect technology; optimal reverse scaling; polylithic interconnect technology; system-on-a-chip; Copper; Delay; Energy dissipation; Frequency; Integrated circuit interconnections; MOSFET circuits; Metal-insulator structures; Power system interconnection; Scattering; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Circuits Digest of Technical Papers, 2002. Symposium on
  • Conference_Location
    Honolulu, HI, USA
  • Print_ISBN
    0-7803-7310-3
  • Type

    conf

  • DOI
    10.1109/VLSIC.2002.1015027
  • Filename
    1015027