DocumentCode
1901657
Title
The evolution of monolithic and polylithic interconnect technology
Author
Meindl, J.D.
Author_Institution
Microelectron. Res. Center, Georgia Inst. of Technol., Atlanta, GA, USA
fYear
2002
fDate
13-15 June 2002
Firstpage
2
Lastpage
5
Abstract
Monolithic interconnect technology has evolved rapidly over the past four decades in order to keep pace with advances in transistor density and performance. Optimal reverse scaling, integrated architectures for global signal, power and clock distribution networks of a heterogeneous system-on-a-chip, 3D integration and microphotonic interconnects offer promising approaches to satisfy future stringent monolithic interconnect requirements of GSI. Polylithic integration featuring batch processing of high density chip input/output interconnects and high density printed wiring board interconnects is projected as an increasingly important feature of future gigascale microsystems.
Keywords
ULSI; VLSI; integrated circuit interconnections; monolithic integrated circuits; 3D integration; GSI; SoC; batch processing; high density chip input/output interconnects; microphotonic interconnects; monolithic interconnect technology; optimal reverse scaling; polylithic interconnect technology; system-on-a-chip; Copper; Delay; Energy dissipation; Frequency; Integrated circuit interconnections; MOSFET circuits; Metal-insulator structures; Power system interconnection; Scattering; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Circuits Digest of Technical Papers, 2002. Symposium on
Conference_Location
Honolulu, HI, USA
Print_ISBN
0-7803-7310-3
Type
conf
DOI
10.1109/VLSIC.2002.1015027
Filename
1015027
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