DocumentCode :
1902138
Title :
Gate-capacitance extraction from RF C-V measurements [MOS device applications]
Author :
Sasse, G.T. ; de Kort, R. ; Schmitz, J.
Author_Institution :
MESA Res. Inst., Twente Univ., Enschede, Netherlands
fYear :
2004
fDate :
21-23 Sept. 2004
Firstpage :
113
Lastpage :
116
Abstract :
In this work, a full two-port analysis of an RF C-V measurement set-up is given. This two-port analysis gives insight on the limitations of the commonly used gate capacitance extraction, based on the Y11 parameter of the device. It is shown that the parasitics of the device can disturb the extracted gate capacitance and a new extraction scheme, based on the Z-matrix, is introduced that eliminates the effect of these parasitics. Measurement results prove the validity of this new extraction scheme, under different conditions.
Keywords :
MIS devices; capacitance measurement; impedance matrix; semiconductor device measurement; two-port networks; CMOS devices; RF C-V measurements; Z-matrix extraction scheme; device parasitics; gate-capacitance extraction; two-port analysis; Capacitance measurement; Capacitance-voltage characteristics; Current measurement; Electrical resistance measurement; Equivalent circuits; Frequency measurement; MOS capacitors; Parasitic capacitance; Radio frequency; Tunneling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Device Research conference, 2004. ESSDERC 2004. Proceeding of the 34th European
Print_ISBN :
0-7803-8478-4
Type :
conf
DOI :
10.1109/ESSDER.2004.1356501
Filename :
1356501
Link To Document :
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