DocumentCode
1902640
Title
A robust array architecture for a capacitorless MISS tunnel-diode memory
Author
Hanzawa, S. ; Sakata, T. ; Sekiguchi, T. ; Matsuoka, H.
Author_Institution
Central Res. Lab., Hitachi Ltd., Tokyo, Japan
fYear
2002
fDate
13-15 June 2002
Firstpage
150
Lastpage
153
Abstract
With the aim of applying a MISS tunnel-diode cell to a high-density RAM, we studied its problems and developed three circuit techniques to solve them. The first, a hierarchical bit-line structure increases the number of memory cells in a bit-line and reduces the number of sense amplifiers. The second, a twin-dummy-cell technique generates a proper reference signal to discriminate read currents. The third, a standby-voltage control scheme reduces background currents and suppresses the degeneration of the signal current. These techniques enable a high-density RAM to use the capacitorless MISS-diode memory cell, whose effective cell area is 6F/sup 2/ (F: minimum feature size). The third technique increases the signal current from 0.25 to 0.85 compared to the original one.
Keywords
MIS devices; VLSI; cellular arrays; integrated memory circuits; memory architecture; random-access storage; tunnel diodes; capacitorless MISS tunnel-diode memory; circuit techniques; hierarchical bit-line structure; high-density RAM; reference signal generation; robust array architecture; sense amplifiers; standby-voltage control scheme; twin-dummy-cell technique; Acceleration; Circuits; Costs; Diodes; Laboratories; Random access memory; Read-write memory; Robustness; Signal generators; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Circuits Digest of Technical Papers, 2002. Symposium on
Conference_Location
Honolulu, HI, USA
Print_ISBN
0-7803-7310-3
Type
conf
DOI
10.1109/VLSIC.2002.1015070
Filename
1015070
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