DocumentCode :
1903206
Title :
An effective method for yield enhancement using zonal defect recognition
Author :
Ono, Makoto ; Nemoto, Kazunori ; Ariga, Makoto
Author_Institution :
Semicond. & Integrated Circuits Div., Hitachi Ltd., Yokohama, Japan
fYear :
1997
fDate :
6-8 Oct 1997
Abstract :
This paper presents a zonal defect recognition algorithm that can be applied to the problem of automated defect recognition in semiconductor manufacturing, The algorithm uses digital image processing techniques and template matching to achieve a high recognition rate by classifying zonal defects into one of three defect types: clustered defects, gross defects, or repetitive defects. The feasibility of using the algorithm for automated detection was demonstrated experimentally. Application of the algorithm to actual production lines is expected to contribute to rapid yield ramp-up
Keywords :
automatic testing; crystal defects; image matching; integrated circuit yield; production testing; automated defect recognition; clustered defects; digital image processing techniques; gross defects; production lines; recognition rate; repetitive defects; template matching; yield enhancement; zonal defect recognition; Clustering algorithms; Digital images; Image converters; Image recognition; Integrated circuit yield; Manufacturing processes; Particle scattering; Production; Semiconductor device manufacture; Yield estimation;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Manufacturing Conference Proceedings, 1997 IEEE International Symposium on
Conference_Location :
San Francisco, CA
Print_ISBN :
0-7803-3752-2
Type :
conf
DOI :
10.1109/ISSM.1997.664577
Filename :
664577
Link To Document :
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