DocumentCode :
1903269
Title :
Analysis of surface-related deep-trap effects on gate-lag phenomena in GaAs MESFETs
Author :
Horio, K. ; Yamada, T.
Author_Institution :
Fac. of Syst. Eng., Shibaura Inst. of Technol., Tokyo, Japan
fYear :
1996
fDate :
3-6 Nov. 1996
Firstpage :
175
Lastpage :
178
Abstract :
Effects of surface states on gate-lag phenomena in GaAs MESFETs are studied by 2D simulation. It is shown that the deep-acceptor-like state plays a dominant role in determining the characteristics. To reduce the gate-lag, the deep acceptor should be made electron-trap-like. This can be realized by reducing the surface-state density. Some device structures expected to have less gate-lag are also described.
Keywords :
III-V semiconductors; Schottky gate field effect transistors; deep levels; electron traps; gallium arsenide; semiconductor device models; surface states; 2D simulation; GaAs; GaAs MESFETs; deep-acceptor-like state; gate-lag phenomena; surface-related deep-trap effects; surface-state density reduction; Analytical models; Charge carrier processes; Energy capture; Energy states; Gallium arsenide; MESFETs; Modeling; Poisson equations; Systems engineering and theory; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Gallium Arsenide Integrated Circuit (GaAs IC) Symposium, 1996. Technical Digest 1996., 18th Annual
Conference_Location :
Orlando, FL, USA
ISSN :
1064-7775
Print_ISBN :
0-7803-3504-X
Type :
conf
DOI :
10.1109/GAAS.1996.567844
Filename :
567844
Link To Document :
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