DocumentCode
1903919
Title
The Fabrication of High Aspect Ratio THz Metamaterials
Author
Gallant, Andrew J. ; Wood, David ; Levitt, J.A. ; Kaliteevski, M. ; Petty, Michael C. ; Brand, Sebastian ; Abram, R.A. ; Chamberlain, J.M.
Author_Institution
Durham Univ., Durham
fYear
2006
fDate
19-19 Sept. 2006
Firstpage
117
Lastpage
120
Abstract
Micromachined metamaterials will be required to provide filters and lenses for the next generation of THz imagers and microscopes. As an example of this emerging technology, we demonstrate here how UV-based surface micromachining can be used to fabricate extremely high aspect ratio pillar arrays. These artificial plasmonic materials act as efficient bandpass filters with a relative transmission of up to 97% measured in the pass band.
Keywords
band-pass filters; metamaterials; submillimetre wave imaging; THz imagers; THz microscopes; UV-based surface micromachining; artificial plasmonic materials; bandpass filters; high aspect ratio pillar arrays; micromachined metamaterials; SU8; THz; filter; metamaterial;
fLanguage
English
Publisher
iet
Conference_Titel
Metamaterials for Microwave and (Sub) Millimetrewave Applications: Electromagnetic Bandgap and Double Negative Design, Structures, Devices and Experimental Validation, 2006. The Institution of Engineering and Technology Seminar on
Conference_Location
London
Print_ISBN
0-86341-679-9
Type
conf
Filename
4125949
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