DocumentCode :
1904032
Title :
Ultra High Density HfO2 Nanodots Memory for Scaling
Author :
Wakai, H. ; Kobayashi, M. ; Kumise, T. ; Yamaguchi, M. ; Nakanishi, T. ; Tanaka, H.
fYear :
2006
fDate :
2006
Firstpage :
58
Lastpage :
59
Keywords :
Amorphous materials; Channel bank filters; Chemical vapor deposition; Crystallization; Hafnium oxide; Rapid thermal annealing; Semiconductor films; Temperature; Transistors; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Non-Volatile Semiconductor Memory Workshop, 2006. IEEE NVSMW 2006. 21st
Conference_Location :
Monterey, CA, USA
Print_ISBN :
1-4244-0027-9
Type :
conf
DOI :
10.1109/.2006.1629493
Filename :
1629493
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=1904032
