• DocumentCode
    1904500
  • Title

    Thermal stress evaluation of a PCRAM material Ge2Sb2Te5

  • Author

    Chen, K.N. ; Krusin-Elbaum, L. ; Cabral, C., Jr. ; Lavoie, C. ; Sun, J. ; Rossnagel, S.

  • Author_Institution
    IBM T. J. Watson Res. Center, Yorktown Heights, NY
  • fYear
    2006
  • fDate
    12-16 Feb. 2006
  • Firstpage
    97
  • Lastpage
    98
  • Abstract
    In addition to the huge resistivity changes, the phase-change switching process is accompanied by a significant volume change (Pedersen et al., 2001), which in turn can result in large stresses. This can become a serious reliability issue, particularly in small device cells utilizing under- and over-layers of suitable contact metals. It is important then to evaluate the magnitude and the sign of stress during the phase changes, and to ascertain the effect of capping layers. In this paper, we report distinct stress signatures in a phase change material, Ge2Sb2Te5 (GST). As GST may be integrated in devices with Ti/TiN (for adhesion and diffusion barrier considerations), the stress evolution in such sandwiched structures is addressed
  • Keywords
    antimony compounds; germanium compounds; integrated circuit reliability; phase change materials; random-access storage; thermal stresses; titanium compounds; GST phase change material; Ge2Sb2Te5; PCRAM material; Ti-TiN; capping layers; contact metals; diffusion barrier; phase-change switching; reliability; sandwiched structures; stress evolution; stress signatures; thermal stress evaluation; Compressive stress; Conductivity; Crystallization; Optical films; Phase change materials; Phase change random access memory; Surface morphology; Tensile stress; Thermal stresses; Tin;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Non-Volatile Semiconductor Memory Workshop, 2006. IEEE NVSMW 2006. 21st
  • Conference_Location
    Monterey, CA
  • Print_ISBN
    1-4244-0027-9
  • Type

    conf

  • DOI
    10.1109/.2006.1629511
  • Filename
    1629511