DocumentCode
1904500
Title
Thermal stress evaluation of a PCRAM material Ge2Sb2Te5
Author
Chen, K.N. ; Krusin-Elbaum, L. ; Cabral, C., Jr. ; Lavoie, C. ; Sun, J. ; Rossnagel, S.
Author_Institution
IBM T. J. Watson Res. Center, Yorktown Heights, NY
fYear
2006
fDate
12-16 Feb. 2006
Firstpage
97
Lastpage
98
Abstract
In addition to the huge resistivity changes, the phase-change switching process is accompanied by a significant volume change (Pedersen et al., 2001), which in turn can result in large stresses. This can become a serious reliability issue, particularly in small device cells utilizing under- and over-layers of suitable contact metals. It is important then to evaluate the magnitude and the sign of stress during the phase changes, and to ascertain the effect of capping layers. In this paper, we report distinct stress signatures in a phase change material, Ge2Sb2Te5 (GST). As GST may be integrated in devices with Ti/TiN (for adhesion and diffusion barrier considerations), the stress evolution in such sandwiched structures is addressed
Keywords
antimony compounds; germanium compounds; integrated circuit reliability; phase change materials; random-access storage; thermal stresses; titanium compounds; GST phase change material; Ge2Sb2Te5; PCRAM material; Ti-TiN; capping layers; contact metals; diffusion barrier; phase-change switching; reliability; sandwiched structures; stress evolution; stress signatures; thermal stress evaluation; Compressive stress; Conductivity; Crystallization; Optical films; Phase change materials; Phase change random access memory; Surface morphology; Tensile stress; Thermal stresses; Tin;
fLanguage
English
Publisher
ieee
Conference_Titel
Non-Volatile Semiconductor Memory Workshop, 2006. IEEE NVSMW 2006. 21st
Conference_Location
Monterey, CA
Print_ISBN
1-4244-0027-9
Type
conf
DOI
10.1109/.2006.1629511
Filename
1629511
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