DocumentCode
1905346
Title
Performance and reliability of airgaps for advanced BEOL Interconnects
Author
Nitta, S. ; Edelstein, D. ; Ponoth, S. ; Clevenger, L. ; Liu, X. ; Standaert, T.
Author_Institution
IBM T. J. Watson Research Center, Yorktown Heights, NY 10598
fYear
2008
fDate
1-4 June 2008
Firstpage
191
Lastpage
192
Abstract
In this paper we present new modeling and measured data to address detailed performance and reliability considerations of multi-level airgaps. Using finite element modeling, we analyzed the capacitance distributions in the airgaps while restricting openings in the cap layers for increased mechanical and electrical reliability. Despite this restriction, capacitance reductions can be maximized by expanding the gap in the low-k SiCOH dielectric underneath the cap, and by increasing gap depth. Relevant BEOL simulation, performance and reliability data has been obtained and will be presented in this context
Keywords
Capacitance; Context modeling; Dielectric constant; Dielectric materials; Finite element methods; Manufacturing; Microprocessors; Production; Self-assembly; Wiring;
fLanguage
English
Publisher
ieee
Conference_Titel
Interconnect Technology Conference, 2008. IITC 2008. International
Conference_Location
Burlingame, CA, USA
Print_ISBN
978-1-4244-1911-1
Electronic_ISBN
978-1-4244-1912-8
Type
conf
DOI
10.1109/IITC.2008.4546963
Filename
4546963
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