• DocumentCode
    1905346
  • Title

    Performance and reliability of airgaps for advanced BEOL Interconnects

  • Author

    Nitta, S. ; Edelstein, D. ; Ponoth, S. ; Clevenger, L. ; Liu, X. ; Standaert, T.

  • Author_Institution
    IBM T. J. Watson Research Center, Yorktown Heights, NY 10598
  • fYear
    2008
  • fDate
    1-4 June 2008
  • Firstpage
    191
  • Lastpage
    192
  • Abstract
    In this paper we present new modeling and measured data to address detailed performance and reliability considerations of multi-level airgaps. Using finite element modeling, we analyzed the capacitance distributions in the airgaps while restricting openings in the cap layers for increased mechanical and electrical reliability. Despite this restriction, capacitance reductions can be maximized by expanding the gap in the low-k SiCOH dielectric underneath the cap, and by increasing gap depth. Relevant BEOL simulation, performance and reliability data has been obtained and will be presented in this context
  • Keywords
    Capacitance; Context modeling; Dielectric constant; Dielectric materials; Finite element methods; Manufacturing; Microprocessors; Production; Self-assembly; Wiring;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Interconnect Technology Conference, 2008. IITC 2008. International
  • Conference_Location
    Burlingame, CA, USA
  • Print_ISBN
    978-1-4244-1911-1
  • Electronic_ISBN
    978-1-4244-1912-8
  • Type

    conf

  • DOI
    10.1109/IITC.2008.4546963
  • Filename
    4546963