DocumentCode
1905492
Title
A Silicon Vertical JFET Compatible with Standard 0.7 μm CMOS Technology
Author
Granier, A. ; Mouis, M. ; Degors, N. ; Kirtsch, J. ; Chantre, A.
Author_Institution
France Telecom, CNET/CNS, BP 98, F-38243 Meylan Cedex, France.
fYear
1992
fDate
14-17 Sept. 1992
Firstpage
83
Lastpage
86
Abstract
This paper reports the fabrication of vertical junction field-effect transistors (v-JFETs) with standard 0.7 /sp mu/m CMOS technology. The process flow is described and the device feasibility is demonstrated. The measured electrical and frequency performances are in good agreement with the simulation results when parasitic capacitances, inherent to the non-optimised layout presently used, are taken into account. It is shown that, with a specific interdigited mask design, a transit frequency higher than 10 GHz could be achieved with a 1.6 μm periodicity.
Keywords
CMOS process; CMOS technology; FETs; Fabrication; Fingers; Frequency; Measurement standards; Schottky gate field effect transistors; Silicon; Standards publication;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid State Device Research Conference, 1992. ESSDERC '92. 22nd European
Conference_Location
Leuven, Belgium
Print_ISBN
0444894780
Type
conf
Filename
5435208
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