• DocumentCode
    1905492
  • Title

    A Silicon Vertical JFET Compatible with Standard 0.7 μm CMOS Technology

  • Author

    Granier, A. ; Mouis, M. ; Degors, N. ; Kirtsch, J. ; Chantre, A.

  • Author_Institution
    France Telecom, CNET/CNS, BP 98, F-38243 Meylan Cedex, France.
  • fYear
    1992
  • fDate
    14-17 Sept. 1992
  • Firstpage
    83
  • Lastpage
    86
  • Abstract
    This paper reports the fabrication of vertical junction field-effect transistors (v-JFETs) with standard 0.7 /sp mu/m CMOS technology. The process flow is described and the device feasibility is demonstrated. The measured electrical and frequency performances are in good agreement with the simulation results when parasitic capacitances, inherent to the non-optimised layout presently used, are taken into account. It is shown that, with a specific interdigited mask design, a transit frequency higher than 10 GHz could be achieved with a 1.6 μm periodicity.
  • Keywords
    CMOS process; CMOS technology; FETs; Fabrication; Fingers; Frequency; Measurement standards; Schottky gate field effect transistors; Silicon; Standards publication;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid State Device Research Conference, 1992. ESSDERC '92. 22nd European
  • Conference_Location
    Leuven, Belgium
  • Print_ISBN
    0444894780
  • Type

    conf

  • Filename
    5435208