Automatic defects separation from background LSI patterns using advanced image processing techniques

Author

Maruo, Kazuyuki ; Yamaguchi, Takahiro ; Ichikawa, Masayoshi ; Shibata, Tadashi ; Ohmi, Tadahiro

Author_Institution

ADVANTEST Labs. Ltd., Sendai, Japan

fYear

1997

fDate

6-8 Oct 1997

Abstract

This paper presents an automatic defects separation system which automatically extracts defect information from complicated background LSI patterns. Based on a scanning electron microscope (SEM) image, the defects on the wafer are characterized in terms of their locations and sizes. For this purpose, two image processing techniques, the Hough transform and the wavelet transform, have been employed. By experiments, it has been demonstrated that the system is very effective in defect identification and will be used as an integral part in future automatic defect pattern classification systems

Keywords

Hough transforms; automatic optical inspection; identification; image classification; integrated circuit yield; large scale integration; scanning electron microscopy; wavelet transforms; Hough transform; SEM image; automatic defect pattern classification systems; automatic defects separation; automatically extracts defect information; background LSI patterns; defect identification; defect location; defect size; image processing techniques; scanning electron microscope image; wavelet transform; Filters; Humans; Image edge detection; Image processing; Integrated circuit interconnections; Laboratories; Large scale integration; Scanning electron microscopy; Ultra large scale integration; Wavelet transforms;

fLanguage

English

Publisher

ieee

Conference_Titel

Semiconductor Manufacturing Conference Proceedings, 1997 IEEE International Symposium on

Conference_Location

San Francisco, CA

Print_ISBN

0-7803-3752-2

Type

conf

DOI

10.1109/ISSM.1997.664593

Filename

664593