DocumentCode
1906853
Title
Behaviour of COPs (pits) on substrate surface during growth of thin epitaxial layer-condition of survival as pits on epi surface
Author
Kimura, Mizue ; Shinyashiki, Hiroshi ; Shimanuki, Yuri
Author_Institution
Mitsubishi Mater. Silicon Corp., Chiba, Japan
fYear
1997
fDate
6-8 Oct 1997
Abstract
Behaviour of COPs during epitaxial growth is investigated for two growth conditions. The critical thickness where COPs disappear depends on the growth conditions. In the case of atmospheric pressure epitaxy using SiHCl3, the epitaxial thickness where COPs disappear is 0.4 μm. In contrast COPs do not disappear up to 5 μm in the case of reduced pressure epitaxy using SiH2Cl2. The shrink of COPs during epitaxial growth depends on the anisotropy of growth; they remain on the epitaxial layer surface when the growth condition is isotropic
Keywords
ULSI; crystal defects; semiconductor growth; vapour phase epitaxial growth; 0.4 to 5 micron; COPs; ULSI; anisotropy; atmospheric pressure epitaxy; critical thickness; pits; reduced pressure epitaxy; substrate surface; survival condition; thin epitaxial layer growth; Cities and towns; Cleaning; Crystals; Degradation; Epitaxial growth; Epitaxial layers; Inductors; Random access memory; Silicon; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Manufacturing Conference Proceedings, 1997 IEEE International Symposium on
Conference_Location
San Francisco, CA
Print_ISBN
0-7803-3752-2
Type
conf
DOI
10.1109/ISSM.1997.664594
Filename
664594
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