DocumentCode :
1906900
Title :
Low temperature growth of carbon nanotube by thermal CVD with FeZrN catalyst
Author :
Shiroishi, T. ; Sawada, T. ; Hosono, A. ; Nakata, S. ; Kanazawa, Y. ; Takai, M.
Author_Institution :
Mitsubishi Electr. Corp., xxxx, Japan
fYear :
2003
fDate :
7-11 July 2003
Firstpage :
13
Lastpage :
14
Abstract :
In order to make carbon nanotubes grow, the catalyst film that is deposited on the substrate must be transformed into fine particles. However, it is difficult to transform the catalyst film into fine particles at low temperature. A method in which the etching gas is used to transform the catalyst film into fine particles has been reported. However, because the NH/sub 3/ is harmful, expensive gas removal equipment has to be prepared. We achieved the growth of carbon nanotubes on soda lime glass at low temperature (under 550 C) by the use of a novel catalyst, FeZrN, without the etching gas.
Keywords :
carbon nanotubes; catalysis; chemical vapour deposition; field emission displays; C-FeZrN; FED; FeZrN catalyst; carbon nanotube; soda lime glass substrate; thermal CVD; Carbon nanotubes; Cathodes; Electron sources; Furnaces; Glass; Iron; Scanning electron microscopy; Substrates; Temperature; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Microelectronics Conference, 2003. Technical Digest of the 16th International
Conference_Location :
Osaka, Japan
Print_ISBN :
4-8181-9515-4
Type :
conf
DOI :
10.1109/IVMC.2003.1222959
Filename :
1222959
Link To Document :
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