DocumentCode
1906981
Title
Optical characterization of strained InGaAs/InP quantum well structures
Author
Wolter, K. ; Schwedler, R. ; Gallmann, B. ; Jaekel, Ch. ; Stollenwerk, M. ; Camassel, J. ; Laurenti, J.P. ; Juillaguet, S.
Author_Institution
Institute of Semiconductor Electronics II, RWTH Aachen, FRG
fYear
1991
fDate
16-19 Sept. 1991
Firstpage
593
Lastpage
596
Abstract
The effects of strain on the optical properties of In1-x Gax As/InP multiple-quantum well structures grown by low pressure metal organic vapor phase epitaxy have been investigated by photoluminescence spectroscopy. The investigated composition range is varied between 0.17 ¿ xGa ¿ 1.00. Sputtered neutrals mass spectrometry has been used to calibrate the growth interpolated nominal compositions. Distinct peaks from monolayer variations of well thickness are observed from all samples. The analysis of the PL-spectra leads to the assumption of an intermediate layer of InAs0.65 P0.35 at the InP to In1=x Gax As (lower) interface.
Keywords
Energy measurement; Fluid flow measurement; Geographic Information Systems; Indium gallium arsenide; Indium phosphide; Lattices; Mass spectroscopy; Position measurement; Temperature distribution; Thickness measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid State Device Research Conference, 1991. ESSDERC '91. 21st European
Conference_Location
Montreux, Switzerland
Print_ISBN
0444890661
Type
conf
Filename
5435264
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