Title :
Extraction of FET parameters at low drain bias by taking into account the dependence of mobility on 2D electron gas concentration
Author :
Py, M.A. ; Haddab, Y. ; Shi, Z.M. ; Bühlmann, H. -J ; Moreira, M.V.Baeta ; Ilegems, M.
Author_Institution :
Institute for Micro- and Optoelectronics, Swiss Federal Institute of Technology, CH-1015 Lausanne, Switzerland
Abstract :
An original method for the extraction of FET parameters at low drain bias is presented. It is based on a simple linear charge-control model and on a power-law dependence (with an exponent k ≫ 0 for GaAs/AIGaAs MODFET´s and k ≪ 0 for Si-MOSFET´s) of the low-field mobility ¿ on the two-dimensional electron gas (2DEG) concentration nS, valid in a cerain range of gate voltages. Simple analytical expressions for the transfer characteristics Ids-Vgs and gm-Vgs at low drain bias are combined to extact reliable values of the threshold voltage Vt, the power exponent k, the total parasitic series resistance (Rs+Rd) and an important control parameter ô. We verified that the values of ô and k extracted on a test MODFET at 300 and 77 K agree very well with those deduced directly from Hall measurements on gated Hall-bridge structures. Our analysis is also applied to extract MOSFET parameters at room temperature.
Keywords :
Electrical resistance measurement; Electron mobility; FETs; Gallium arsenide; HEMTs; MODFETs; MOSFET circuits; Testing; Threshold voltage; Voltage control;
Conference_Titel :
Solid State Device Research Conference, 1991. ESSDERC '91. 21st European
Conference_Location :
Montreux, Switzerland