Title :
Field electron emission from cupric oxide-nanobelt films
Author :
Jun Chen ; Deng, S.Z. ; Xu, N.S. ; Weixin Zhang ; Xiaogang Wen ; Shihe Yang
Author_Institution :
State Key Lab. of Optoelectron. Mater. & Technol., Zhongshan Univ., Guangzhou, China
Abstract :
Films of aligned cupric oxide-nanobelts have been prepared in an aqueous solution at room temperature. Field electron emission characteristics, including emission current-applied field characteristic, emission site distribution and emission current stability have been studied.
Keywords :
copper compounds; electron field emission; nanostructured materials; narrow band gap semiconductors; semiconductor thin films; 293 to 298 K; CuO; applied field; cupric oxide nanobelt films; emission current stability; emission site distribution; field electron emission; room temperature; Chemical technology; Copper; Current density; Electron emission; Materials science and technology; Morphology; Scanning electron microscopy; Semiconductor films; Semiconductor materials; Transmission electron microscopy;
Conference_Titel :
Vacuum Microelectronics Conference, 2003. Technical Digest of the 16th International
Conference_Location :
Osaka, Japan
Print_ISBN :
4-8181-9515-4
DOI :
10.1109/IVMC.2003.1222965
