Title :
Measurement of field emission characteristics from transition metal nitride and carbide thin films
Author :
Gotoh, Y. ; Liao, M.Y. ; Tsuji, H. ; Ishikawa, J.
Author_Institution :
Dept. of Electron. Sci. & Eng., Kyoto Univ., Japan
Abstract :
In this paper, we report the measurements of the field emission characteristics from these materials.
Keywords :
chromium compounds; field emission; hafnium compounds; sputtered coatings; thin films; vanadium compounds; CrC; HfN; Si; VC; carbide thin films; field emission characteristics; transition metal nitride; Cathodes; Cyclic redundancy check; Fluctuations; Ion beams; Magnetic field measurement; Niobium compounds; Sputtering; Substrates; Transistors; Virtual colonoscopy;
Conference_Titel :
Vacuum Microelectronics Conference, 2003. Technical Digest of the 16th International
Conference_Location :
Osaka, Japan
Print_ISBN :
4-8181-9515-4
DOI :
10.1109/IVMC.2003.1222970
