DocumentCode :
1907311
Title :
On the Temperature Dependence of Polysilicon Emitter Transistors
Author :
Doyle, Denis J. ; Lane, William A.
Author_Institution :
National Microelectronics Research Centre, University College, Cork, Ireland
fYear :
1991
fDate :
16-19 Sept. 1991
Firstpage :
529
Lastpage :
532
Abstract :
This paper investigates the ßf temperature behaviour of polysilicon emitter transistors with a view to understanding the device physics. Realigned polysilicon emitters are shown to behave as ideal single crystal transistors. Transistors with true polysilicon emitters exhibit a reduced temperature sensitivity of ßf. This is thought to result from a potential barrier at the interface. This potential barrier is dependent on the polysilicon doping level.
Keywords :
Doping; Furnaces; Microelectronics; Photonic band gap; Physics; Rapid thermal annealing; Temperature dependence; Temperature measurement; Temperature sensors; Thermionic emission;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid State Device Research Conference, 1991. ESSDERC '91. 21st European
Conference_Location :
Montreux, Switzerland
Print_ISBN :
0444890661
Type :
conf
Filename :
5435278
Link To Document :
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