• DocumentCode
    1907311
  • Title

    On the Temperature Dependence of Polysilicon Emitter Transistors

  • Author

    Doyle, Denis J. ; Lane, William A.

  • Author_Institution
    National Microelectronics Research Centre, University College, Cork, Ireland
  • fYear
    1991
  • fDate
    16-19 Sept. 1991
  • Firstpage
    529
  • Lastpage
    532
  • Abstract
    This paper investigates the ßf temperature behaviour of polysilicon emitter transistors with a view to understanding the device physics. Realigned polysilicon emitters are shown to behave as ideal single crystal transistors. Transistors with true polysilicon emitters exhibit a reduced temperature sensitivity of ßf. This is thought to result from a potential barrier at the interface. This potential barrier is dependent on the polysilicon doping level.
  • Keywords
    Doping; Furnaces; Microelectronics; Photonic band gap; Physics; Rapid thermal annealing; Temperature dependence; Temperature measurement; Temperature sensors; Thermionic emission;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid State Device Research Conference, 1991. ESSDERC '91. 21st European
  • Conference_Location
    Montreux, Switzerland
  • Print_ISBN
    0444890661
  • Type

    conf

  • Filename
    5435278