• DocumentCode
    1907390
  • Title

    Double gates structure carbon nanotube field emission display

  • Author

    Qilong Wang ; Wei Lei ; Baoping Wang ; Xiaobing Zhang ; Xuedong Zhou ; Min Liu

  • Author_Institution
    Dept. of Electron. Eng., Southeast Univ., Nanjing, China
  • fYear
    2003
  • fDate
    7-11 July 2003
  • Firstpage
    43
  • Lastpage
    44
  • Abstract
    A new structure of carbon nanotube field emission display has been studied. To shrink the range of the modulate voltage applied on the gate electrode, which is placed in the CNT/spl I.bar/FED, we have designed and fabricated one double gates structure. In the new structure, the one below, which is near to the CNT cathode, is made of metal mesh with MgO or MgF/sub 2/ layer, and the primary electrons that come from the cathode can excite the secondary electrons from the dielectric layer. The gate above the first one acts as the real modulate electrode in the new structure that can control the electrons, most of which are the secondary electrons. Because of the low energy of the secondary electrons, the range of the modulate voltage can be withdrawn. In order to find the best result, as to the modulate electrode made of metal mesh, we have the metal mesh covered with MgF/sub 2/ layer or not. The comparisons are shown in the paper. The simulation and the experiment data, which are given in the paper show we have got an effective method to reduce the expense of the driver circuit of the CNT/spl I.bar/FED.
  • Keywords
    carbon nanotubes; cathodes; driver circuits; electrochemical electrodes; field emission displays; mesh generation; C; CNT FED; CNT cathode; dielectric layer; double gates structure carbon nanotube; driver circuit; field emission display; gate electrode; metal mesh; primary electrons; secondary electrons; Anodes; Carbon nanotubes; Cathodes; Dielectrics; Driver circuits; Electrodes; Electron emission; Flat panel displays; Liquid crystal displays; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Microelectronics Conference, 2003. Technical Digest of the 16th International
  • Conference_Location
    Osaka, Japan
  • Print_ISBN
    4-8181-9515-4
  • Type

    conf

  • DOI
    10.1109/IVMC.2003.1222974
  • Filename
    1222974