DocumentCode
1907404
Title
Breakdown predictions of microstrip interconnects and coplanar waveguide-built devices in the presence of HP-EMPs
Author
Yin, Wen-Yan ; Dong, X.T. ; Mao, Junfa ; Li, Le-Wei
Author_Institution
Dept. of Electron. Eng., Shanghi Jiao Tong Univ., Shanghai
fYear
2006
fDate
Feb. 27 2006-March 3 2006
Firstpage
445
Lastpage
448
Abstract
Electrical breakdown of microstrip interconnects and coplanar waveguide-built devices in the presence of high-power electromagnetic pulses (HP-EMP) is addressed in this paper, and some effective methodologies are outlined and proposed for fast predicting maximum current carrying density of bonding wire, electric field breakdown strength of thin film capacitors, average and peak power handling capabilities of conventional and thin film microstrip and coplanar waveguides. An efficient FDTD procedure is also presented for characterizing electric breakdown strength of the substrate dielectrics based on their high-field conduction models
Keywords
coplanar waveguide components; electromagnetic pulse; finite difference time-domain analysis; microstrip components; thin film devices; FDTD; bonding wire; breakdown predictions; coplanar waveguide-built devices; electric field breakdown; electrical breakdown; high-field conduction models; high-power electromagnetic pulses; microstrip interconnects; substrate dielectrics; thin film capacitors; thin film microstrip; Coplanar waveguides; Dielectric substrates; Dielectric thin films; Electric breakdown; Electromagnetic devices; Electromagnetic fields; Electromagnetic scattering; Electromagnetic waveguides; Microstrip; Thin film devices;
fLanguage
English
Publisher
ieee
Conference_Titel
Electromagnetic Compatibility, 2006. EMC-Zurich 2006. 17th International Zurich Symposium on
Conference_Location
Singapore
Print_ISBN
3-9522990-3-0
Type
conf
DOI
10.1109/EMCZUR.2006.214967
Filename
1629657
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