DocumentCode
1907465
Title
Low temperature carbon nanotubes for field emission display
Author
Kang, S. ; Bae, C. ; Son, W. ; Kim, M.H. ; Yi, J. ; Chang, A. ; Kim, J.J. ; Lee, C.R.
Author_Institution
cDream Corp., San Jose, CA, USA
fYear
2003
fDate
7-11 July 2003
Firstpage
51
Lastpage
52
Abstract
In this article, we developed low temperature CNT growing technology between 470-500/spl deg/C with the glass substrate used in TFT-LCD industry by inductively coupled plasma chemical vapour deposition (ICPCVD).
Keywords
carbon nanotubes; field emission displays; nanotube devices; plasma CVD; 470 to 500 degC; C; TFT-LCD industry; carbon nanotubes; field emission display; glass substrate; inductively coupled plasma chemical vapour deposition; Carbon nanotubes; Chemical industry; Chemical technology; Chemical vapor deposition; Flat panel displays; Glass industry; Plasma applications; Plasma chemistry; Plasma displays; Plasma temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Microelectronics Conference, 2003. Technical Digest of the 16th International
Conference_Location
Osaka, Japan
Print_ISBN
4-8181-9515-4
Type
conf
DOI
10.1109/IVMC.2003.1222978
Filename
1222978
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