DocumentCode :
1907746
Title :
Analysis of post-stress effects in passivated MOSFET´s after Hot-Carrier stress
Author :
de Schrijver, E. ; Heremans, P. ; Bellens, Rik ; Groeseneken, G. ; Maes, H.E.
Author_Institution :
IMEC vzw, Kapeldreef 75, 3001 Leuven, Belgium
fYear :
1991
fDate :
16-19 Sept. 1991
Firstpage :
437
Lastpage :
440
Abstract :
Passivated n-channel transistors of different technologies still show interface trap density increases after termination of hot-carrier stress. A systematic study of this effect and its dependence on various parameters was made, using the Charge-Pumping technique. A tentative model is presented, that explains the observed phenomena.
Keywords :
Charge pumps; Degradation; Electron traps; Hot carrier effects; Hot carriers; MOSFETs; Microelectronics; Stress; Transconductance; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid State Device Research Conference, 1991. ESSDERC '91. 21st European
Conference_Location :
Montreux, Switzerland
Print_ISBN :
0444890661
Type :
conf
Filename :
5435296
Link To Document :
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