DocumentCode :
1907891
Title :
Thermal microtransducers by CMOS technology combined with micromachining
Author :
Baltes, H. ; Moser, D. ; Lenggenhager, R. ; Brand, O.
Author_Institution :
Physical Electronics Laboratory, ETH Zurich, CH-8093 Zurich, Switzerland
fYear :
1991
fDate :
16-19 Sept. 1991
Firstpage :
419
Lastpage :
422
Abstract :
We report the design, fabrication and characterization of thermomechanical microtransducers realized by industrial IC CMOS technology combined with subsequent maskless anisotropic wet etching. Examples include a thermally excited beam resonator, resistive and thermoelectric gas flow sensors, and a thermoelectric power sensor.
Keywords :
CMOS integrated circuits; CMOS technology; Fabrication; Gas detectors; Micromachining; Sensor phenomena and characterization; Textile industry; Thermal sensors; Thermoelectricity; Thermomechanical processes;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid State Device Research Conference, 1991. ESSDERC '91. 21st European
Conference_Location :
Montreux, Switzerland
Print_ISBN :
0444890661
Type :
conf
Filename :
5435300
Link To Document :
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