Title :
Multi-bit electromechanical memory cell for simple fabrication process
Author :
Lee, Kwangseok ; Choi, Woo Young
Author_Institution :
Dept. of Electron. Eng., Sogang Univ., Seoul, South Korea
Abstract :
In this paper, we propose a novel electromechanical memory cell (T cell). The T cell has been demonstrated successfully by the experimental results of its prototype cell. Also, the operation of a unit cell and that of array have been investigated. The T cell is superior to the previously reported H cell in terms of fabrication process complexity since the T cell needs only two metal layers.
Keywords :
circuit complexity; random-access storage; H cell; T cell; fabrication process complexity; metal layer; multibit electromechanical nonvolatile memory cell; unit cell; Arrays; Fabrication; Hysteresis; Metals; Nonvolatile memory; Prototypes; Structural beams;
Conference_Titel :
Silicon Nanoelectronics Workshop (SNW), 2010
Conference_Location :
Honolulu, HI
Print_ISBN :
978-1-4244-7727-2
Electronic_ISBN :
978-1-4244-7726-5
DOI :
10.1109/SNW.2010.5562579