Title :
DRAM Technologies For Today`s Market And Future DRAM Generations
Author :
Neumueller, W. ; Alsmeier, J. ; Bronner, G. ; Ishibashi, S. ; Klose, H.
Author_Institution :
Siemens
fDate :
22-24 September 1997
Keywords :
Capacitors; Computer aided manufacturing; Costs; Electronics industry; Logic; Manufacturing processes; Production; Random access memory; Semiconductor device manufacture; Very large scale integration;
Conference_Titel :
Solid-State Device Research Conference, 1997. Proceeding of the 27th European
Print_ISBN :
2-86332-221-4
DOI :
10.1109/ESSDERC.1997.194379
