DocumentCode :
1908267
Title :
Control of dopant-induced quantum dots by channel geometry
Author :
Moraru, Daniel ; Nakamura, Ryusuke ; Miki, Sakito ; Mizuno, Takeshi ; Tabe, Michiharu
Author_Institution :
Res. Inst. of Electron., Shizuoka Univ., Hamamatsu, Japan
fYear :
2010
fDate :
13-14 June 2010
Firstpage :
1
Lastpage :
2
Abstract :
As device dimensions are continuously scaled down, the discreteness of dopant distribution has a significant effect on conventional device operation and controllability. This paper will show that the structure of dopant-induced quantum dot array can be controlled in nanoscale SOI-FETs containing a large number of dopants by the channel geometry. It is also shown that single electron transport through discrete dopants can be realized by controlling the channel geometry and utilizing the favorable effect of a statistical number of dopants. This may allow control for new applications such as dopant-based turnstiles.
Keywords :
doping profiles; elemental semiconductors; field effect transistors; nanoelectronics; phosphorus; semiconductor quantum dots; silicon; silicon-on-insulator; single electron transistors; Si:P; channel geometry; device operation; dopant distribution; dopant-induced quantum dots; nanoscale SOI-FET; single electron transport; Arrays; Electric potential; FETs; Geometry; Logic gates; Nanoscale devices; Voltage measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Silicon Nanoelectronics Workshop (SNW), 2010
Conference_Location :
Honolulu, HI
Print_ISBN :
978-1-4244-7727-2
Electronic_ISBN :
978-1-4244-7726-5
Type :
conf
DOI :
10.1109/SNW.2010.5562584
Filename :
5562584
Link To Document :
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