• DocumentCode
    1908748
  • Title

    1D Modeling of SOI MOSFETs Using Distinct Quasi-Fermi Potentials

  • Author

    Schubert, M. ; Höfflinger, B. ; Schroeder, D. ; Zingg, R.P.

  • Author_Institution
    Institute for Microelectronics Stuttgart, Allmandring 30, D-7000 Stuttgart 80
  • fYear
    1991
  • fDate
    16-19 Sept. 1991
  • Firstpage
    237
  • Lastpage
    240
  • Abstract
    Distinct electron and hole quasi-Fermi potentials, ¿fn, and ¿fp, are included into a one-dimensional SOI MOSFET model that accounts for finite inversion and depletion layer thicknesses. The inclusion of ¿fn, ¿fp, in the nonlinear analytical model is demonstrated to describe phenomena like kink effect and the multistable-charge-controlled-memory effect (MCCM) in SOI MOSFETs. The calculation of ¿fp(t) depends on the device history and generation/recombination rates.
  • Keywords
    Analytical models; Charge carrier processes; History; MOSFETs; Microelectronics; Semiconductor films; Semiconductor process modeling; Silicon; Spontaneous emission; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid State Device Research Conference, 1991. ESSDERC '91. 21st European
  • Conference_Location
    Montreux, Switzerland
  • Print_ISBN
    0444890661
  • Type

    conf

  • Filename
    5435334