DocumentCode
1908748
Title
1D Modeling of SOI MOSFETs Using Distinct Quasi-Fermi Potentials
Author
Schubert, M. ; Höfflinger, B. ; Schroeder, D. ; Zingg, R.P.
Author_Institution
Institute for Microelectronics Stuttgart, Allmandring 30, D-7000 Stuttgart 80
fYear
1991
fDate
16-19 Sept. 1991
Firstpage
237
Lastpage
240
Abstract
Distinct electron and hole quasi-Fermi potentials, ¿fn , and ¿fp , are included into a one-dimensional SOI MOSFET model that accounts for finite inversion and depletion layer thicknesses. The inclusion of ¿fn , ¿fp , in the nonlinear analytical model is demonstrated to describe phenomena like kink effect and the multistable-charge-controlled-memory effect (MCCM) in SOI MOSFETs. The calculation of ¿fp (t) depends on the device history and generation/recombination rates.
Keywords
Analytical models; Charge carrier processes; History; MOSFETs; Microelectronics; Semiconductor films; Semiconductor process modeling; Silicon; Spontaneous emission; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid State Device Research Conference, 1991. ESSDERC '91. 21st European
Conference_Location
Montreux, Switzerland
Print_ISBN
0444890661
Type
conf
Filename
5435334
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