DocumentCode
1908785
Title
Physics-Based Circuit-Level Model for Sub-Micron MOSFETs
Author
Velghe, R.M.D. ; Klaassen, F.M.
Author_Institution
Philips Research Laboratories, P.O. Box 80.000, 5600 JA Eindhoven, The Netherlands
fYear
1991
fDate
16-19 Sept. 1991
Firstpage
229
Lastpage
232
Abstract
A good circuit-level model for well-scaled submicron MOSFETs is needed in circuit simulators to design integrated circuits with these transistors in an accurate way. Due to the scaling, thinner gate insulators are required and give rise to an increase of the normal electric field in the oxide region. So the effect of surface roughness on the drain current becomes manifest. In addition a further reduction of the current is caused by the increased effect of series resistance caused by the use of graded source/drain junctions. This paper presents a physics-based circuit-level model where these effects are quantitatively taken into account.
Keywords
Integrated circuit modeling; Laboratories; MOSFETs; Microelectronics; Predictive models; Rough surfaces; Solid modeling; Surface resistance; Surface roughness; Threshold voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid State Device Research Conference, 1991. ESSDERC '91. 21st European
Conference_Location
Montreux, Switzerland
Print_ISBN
0444890661
Type
conf
Filename
5435336
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