DocumentCode :
1908785
Title :
Physics-Based Circuit-Level Model for Sub-Micron MOSFETs
Author :
Velghe, R.M.D. ; Klaassen, F.M.
Author_Institution :
Philips Research Laboratories, P.O. Box 80.000, 5600 JA Eindhoven, The Netherlands
fYear :
1991
fDate :
16-19 Sept. 1991
Firstpage :
229
Lastpage :
232
Abstract :
A good circuit-level model for well-scaled submicron MOSFETs is needed in circuit simulators to design integrated circuits with these transistors in an accurate way. Due to the scaling, thinner gate insulators are required and give rise to an increase of the normal electric field in the oxide region. So the effect of surface roughness on the drain current becomes manifest. In addition a further reduction of the current is caused by the increased effect of series resistance caused by the use of graded source/drain junctions. This paper presents a physics-based circuit-level model where these effects are quantitatively taken into account.
Keywords :
Integrated circuit modeling; Laboratories; MOSFETs; Microelectronics; Predictive models; Rough surfaces; Solid modeling; Surface resistance; Surface roughness; Threshold voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid State Device Research Conference, 1991. ESSDERC '91. 21st European
Conference_Location :
Montreux, Switzerland
Print_ISBN :
0444890661
Type :
conf
Filename :
5435336
Link To Document :
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