• DocumentCode
    1908785
  • Title

    Physics-Based Circuit-Level Model for Sub-Micron MOSFETs

  • Author

    Velghe, R.M.D. ; Klaassen, F.M.

  • Author_Institution
    Philips Research Laboratories, P.O. Box 80.000, 5600 JA Eindhoven, The Netherlands
  • fYear
    1991
  • fDate
    16-19 Sept. 1991
  • Firstpage
    229
  • Lastpage
    232
  • Abstract
    A good circuit-level model for well-scaled submicron MOSFETs is needed in circuit simulators to design integrated circuits with these transistors in an accurate way. Due to the scaling, thinner gate insulators are required and give rise to an increase of the normal electric field in the oxide region. So the effect of surface roughness on the drain current becomes manifest. In addition a further reduction of the current is caused by the increased effect of series resistance caused by the use of graded source/drain junctions. This paper presents a physics-based circuit-level model where these effects are quantitatively taken into account.
  • Keywords
    Integrated circuit modeling; Laboratories; MOSFETs; Microelectronics; Predictive models; Rough surfaces; Solid modeling; Surface resistance; Surface roughness; Threshold voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid State Device Research Conference, 1991. ESSDERC '91. 21st European
  • Conference_Location
    Montreux, Switzerland
  • Print_ISBN
    0444890661
  • Type

    conf

  • Filename
    5435336